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Abstract Because of the designable materials properties, compatibility with conventional Si fabrication and thin film processes, and unique physical and chemical properties, PS is a versatile material with potential in a number of different application areas. Optical and optoelectronic applications are based on the tunable optical properties of the porous layer, such as the index of refraction and layer thickness (solar cells, PDs, reflectors), and on the various luminescence phenomena linked to PS (LEDs). Fabrication of PS layers (PSLs) was performed by electrochemical etching process on the front side of textured n+ p Si junctions. The formed porosity was determined gravimetrically within a good range of 88.27 - 97%. The effect of porosity on the structure, electrical, and photoelectrical properties was investigated. Surface morphology and the crystallites size of PS were characterized by using scanning electron microscope (SEM) and X-ray diffraction (XRD) respectively. Scanning electron microscope (SEM) shows the evolution of PSLs morphology through the increase in surface area due to the regular increase in porosity. The broadening of the FWHM obtained from the XRD spectra provided the reduction in the crystallite size. The optical properties of the fabricated PSLs have been characterized by using a UV–Vis spectrophotometer equipped with an integrating sphere attachment. The reflection measurements showed an excellent light trapping at wavelengths ranging from 200 to 1000 nm at 30 mA/cm2 etching current density. The optical absorption coefficient was calculated from the reflection spectra and the optical band gap was determined. The value of the energy gap (Eg) was also determined by applying the Kubelka–Munk (K–M or F(R)) method. The optical band gaps have been found to tunable with the variation of particle size, which attributed to quantum confinement effect. from the photoluminescence (PL) measurements, the PL peak intensity increases upon increasingthe porosity and also shows slight blue shifts at 629 nm and 640 nm as the porosity increases. The band gaps of PSLs obtained from the photoluminescence measurements and from the reflection data were compared. It is found that the band gap increases in a range between 1.84 eV and 2.23 eV, which is higher than the band gap of silicon (1.12 eV). The current-voltage (I-V) characteristics of Al/PS /n+ p /Al junction fabricated at etching current density of 30 mA/cm2 were investigated and compared with the reference Al/n+ p/Al junction. The junction parameters such as series resistance (RS), ideality factor (n) and effective barrier height ( ) were determined by using different methods. It was shown that the values of the series resistance RS and barrier height values using Cheung’s and Norde’s functions are dependent on temperature for the junctions under investigation. Under illumination, the short-circuit current density (JSC) and the open-circuit voltage (VOC) increased from 0.35 mA/cm2 to 5.3 mA/cm2 and from 0.39 V to 0.62 V, respectively. Thephotosensitivity of PSLs solar cells showed a noticeable enhancement in quantum efficiency of the PS cells by increasing the porosity. In this thesis, the structural, optical and electrical properties of the treated textured cells was investigated and compared with the untreated textured cell under the variation of etching current densities. The results confirm that PS layers formed on textured surface can be used as both broadband antireflection coatings and passivation layers for the application in solar cells. |