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Abstract
It is well known that aluminum is an important material for design vessels in different industrial processes. The corrosion and corrosion inhibition of aluminum in different media become very interesting and important owing to its wide applicability in industry.
The purpose of the present investigation is to study the corrosion and corrosion inhibition of aluminum in HCl solutions in absence and presence of some inorganic compounds such as (Chromate, Tungstate and Phosphate) and organic compounds such as (Phenyl hydrazine, Urea, Thiourea, N-allylthiourea, Thiosemicarbazide). Different techniques such as open circuit potential measurements, weight loss, hydrogen evolution, thermometry and galvanostatic polarization are used.