الفهرس 
Thermal Oxidation of SiliconOnly 14 pages are availabe for public view
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Abstract
Process simulation for VLSI technology is not an easy work. The aim is to Jink
the microscopic world to the macroscopic one . As in all introduced models , we have fust to start with assumptions aiming to simplify the problem . One the other hand models are controlled by experimental results where these models are created to represent. The difficulties in process modeling is clear from the range of validity of each model where the supposed physical and chemical processes are assumed to dominate within that range. Understanding process .steps is very important to be able to improve the introduced models, and give the ability to estimate the reality of models results.